4.7 Review

Schottky barrier heights in two-dimensional field-effect transistors: from theory to experiment

期刊

REPORTS ON PROGRESS IN PHYSICS
卷 84, 期 5, 页码 -

出版社

IOP Publishing Ltd
DOI: 10.1088/1361-6633/abf1d4

关键词

Schottky barrier; two-dimensional materials; transistor; first-principles quantum transport simulation

资金

  1. National Natural Science Foundation of China [11704406/11674005/91964101/11904409/12004307]
  2. National Materials Genome Project of China [2016YFB0700600]
  3. Fundamental Research Funds for the Central Universities [19CX05002A]
  4. China Postdoctoral Science Foundation [2018M642721]
  5. Natural Science Basic Research Program of Shaanxi, China [2019JM-355]
  6. Research Foundation of Education Bureau of Shaanxi Province, China [19JS009]
  7. Open Fund of State Key Laboratory of Information Photonics and Optical Communications (Beijing University of Posts and Telecommunications)
  8. High Performance Computing Platform of Peking University

向作者/读者索取更多资源

Over the past decade, two-dimensional semiconductors have attracted wide interest due to their extraordinary properties, with field-effect transistors being commonly used as the device geometry. Direct metal contact is often utilized in 2DSC FETs due to the lack of effective doping techniques. The presence of a Schottky barrier in the metal-2DSC junction significantly impacts the performance of most 2DSC FETs, emphasizing the importance of low SB contacts.
Over the past decade, two-dimensional semiconductors (2DSCs) have aroused wide interest due to their extraordinary electronic, magnetic, optical, mechanical, and thermal properties, which hold potential in electronic, optoelectronic, thermoelectric applications, and so forth. The field-effect transistor (FET), a semiconductor gated with at least three terminals, is pervasively exploited as the device geometry for these applications. For lack of effective and stable substitutional doping techniques, direct metal contact is often used in 2DSC FETs to inject carriers. A Schottky barrier (SB) generally exists in the metal-2DSC junction, which significantly affects and even dominates the performance of most 2DSC FETs. Therefore, low SB or Ohmic contact is highly preferred for approaching the intrinsic characteristics of the 2DSC channel. In this review, we systematically introduce the recent progress made in theoretical prediction of the SB height (SBH) in the 2DSC FETs and the efforts made both in theory and experiments to achieve low SB contacts. From the comparison between the theoretical and experimentally observed SBHs, the emerging first-principles quantum transport simulation turns out to be the most powerful theoretical tool to calculate the SBH of a 2DSC FET. Finally, we conclude this review from the viewpoints of state-of-the-art electrode designs for 2DSC FETs.

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