Ionized particle transport in reactive HiPIMS discharge: correlation between the energy distribution functions of neutral and ionized atoms

We investigated the transport of titanium ions produced in a reactive high-power impulse magnetron sputtering device used for titanium nitride coating deposition. Time-resolved mass spectrometry measurements of ionized sputtered atoms correlated to time-resolved tuneable diode-laser induced fluorescence (TR-TDLIF) measurements of neutral sputtered atoms were used to understand transport features. Based on ion energy distributions of Ti+, we identified four populations of ions and explore their physical origins. The signals of all ion populations decrease strongly when only 1% N-2 is added to the Ar/N-2 gas mixture. Time resolved mass spectrometry confirms the result reported in previous work: the fast target poisoning when nitrogen is added in HiPIMS discharges. Based on the measured energy distribution functions of Ti2+, N+, N-2 (+), and Ar+, we discuss the production of these ions in HiPIMS discharges. The temperature of thermalized sputtered neutral atoms determined by previous TR-TDLIF measurements evidences the physical origin of an ion population with energies lower than 4 eV. According to discharge pressure, cathode voltage, and ion type, we also discuss the physical origins of high-energy ions (>4 eV).

Automated summary

By using time-resolved mass spectrometry and tuneable diode-laser induced fluorescence measurements, we investigated the transport and physical origins of titanium ions in a reactive high-power impulse magnetron sputtering device. The signals of all ion populations decrease significantly when only 1% N-2 is added to the Ar/N-2 gas mixture. The temperature of thermalized sputtered neutral atoms determines the physical origin of ion population with energies lower than 4 eV.