Observation of the relaxation process in fluoroelastomers by dielectric relaxation spectroscopy

The complex dielectric permittivity of fluoroelastomers in response to both frequency and temperature variations was thoroughly investigated by dielectric relaxation spectroscopy. To characterize the various types of relaxation processes, the dispersion spectra of permittivity in the frequency domain were successively deconvoluted using a newly developed simulation program that uses the empirical Havriliak-Negami model based on the Debye dielectric model and conductivity contribution. At 233 K < T 290 K, the ? and ? relaxation processes were independently observed; they merged at T ? 290 K. At T 303 K, and both Maxwell-Wagner-Sillars (MWS) relaxation, known as interfacial polarization, and conductivity relaxation processes were observed. From the ? relaxation process, which is related to the glass transition phenomenon, the glass transition temperature Tg was determined using the Vogel-Fulther-Tamman-Hesse (VFTH) temperature dependence law; the result was similar to the estimate of Tg obtained using differential scanning calorimetry. The temperature dependence of conductivity complies well with VFTH behaviors, whereas the ? and MWS processes can be described using the Arrhenius temperature dependence law. The corresponding activation energies of the rotational side groups and DC conductivity were obtained.

Automated summary

Through dielectric relaxation spectroscopy, the study thoroughly investigated the complex dielectric permittivity of fluoroelastomers in response to frequency and temperature variations. Different relaxation processes were identified and characterized using various models, with parameters related to the glass transition phenomenon and temperature dependence laws obtained for further analysis.