Spontaneous Formation of Ordered Magnetic Domains by Patterning Stress

The formation of ordered magnetic domains in thin films is important for the magnetic microdevices in spin-electronics, magneto-optics, and magnetic microelectromechanical systems. Although inducing anisotropic stress in magnetostrictive materials can achieve the domain assembly, controlling magnetic anisotropy over microscale areas is challenging. In this work, we realized the microscopic patterning of magnetic domains by engineering stress distribution. Deposition of ferromagnetic thin films on nanotrenched polymeric layers induced tensile stress at the interfaces, giving rise to the directional magnetoelastic coupling to form ordered domains spontaneously. By changing the periodicity and shape of nanotrenches, we spatially tuned the geometric configuration of domains by design. Theoretical analysis and micromagnetic characterization confirmed that the local stress distribution by the topographic confinement dominates the forming mechanism of the directed magnetization.

Automated summary

In this work, microscopic patterning of magnetic domains was achieved by engineering stress distribution in ferromagnetic thin films deposited on nanotrenched polymeric layers. The geometric configuration of domains was spatially tuned by changing the periodicity and shape of nanotrenches. The forming mechanism of the directed magnetization was dominantly influenced by the local stress distribution due to topographic confinement.