期刊
MICROSCOPY AND MICROANALYSIS
卷 27, 期 2, 页码 257-265出版社
CAMBRIDGE UNIV PRESS
DOI: 10.1017/S143192762100009X
关键词
dislocation microscopy; ECCI; gallium nitride; HREBSD; MOVPE
资金
- US Department of Energy's National Nuclear Security Administration [DE-NA0003525]
This study characterizes novel star defects in GaN films grown with metal-organic vapor phase deposition (MOVPE) on GaN substrates using electron channeling contrast imaging (ECCI) and high-resolution electron backscatter diffraction (HREBSD). These defects, hundreds of microns in size, tend to aggregate threading dislocations at their centers. They are the intersection of six nearly ideal low-angle tilt boundaries composed of -type pyramidal edge dislocations, each on a unique slip system.
This paper characterizes novel star defects in GaN films grown with metal-organic vapor phase deposition (MOVPE) on GaN substrates with electron channeling contrast imaging (ECCI) and high-resolution electron backscatter diffraction (HREBSD). These defects are hundreds of microns in size and tend to aggregate threading dislocations at their centers. They are the intersection of six nearly ideal low-angle tilt boundaries composed of -type pyramidal edge dislocations, each on a unique slip system.
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