CeO2-based buffer layers via chemical solution deposition: Critical issues and latest developments

Chemical solution deposition of CeO2-based buffer layers is a widely employed strategy for the production of coated conductors. However, the necessary characteristics of biaxial texture, flatness, and chemical inertia are not so easily obtained with this material. In this work of review, the theoretical background of nucleation and epitaxial growth is recalled and the state of the art on the topic is reported, separately addressing the different chemical techniques; the most common issues are discussed and a summary of the most relevant available results is given, using surface roughness as a key parameter for the evaluation of the quality of the buffer layer.

Automated summary

Chemical solution deposition of CeO2-based buffer layers is commonly used for producing coated conductors, although achieving the necessary characteristics of biaxial texture, flatness, and chemical inertia can be challenging. This review explores the theoretical background of nucleation and epitaxial growth, discusses common issues, and summarizes relevant results using surface roughness as a key parameter for evaluating buffer layer quality.