4.7 Article

Patterned growth of β-Ga2O3 thin films for solar-blind deep-ultraviolet photodetectors array and optical imaging application

期刊

JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY
卷 72, 期 -, 页码 189-196

出版社

JOURNAL MATER SCI TECHNOL
DOI: 10.1016/j.jmst.2020.09.015

关键词

Ultrawide-bandgap semiconductor; Solar-blind; Deep ultraviolet photodetection; Patterned growth; Image sensor

资金

  1. National Natural Science Foundation of China (NSFC) [51902078, 62074048]
  2. Fundamental Research Funds for the Central Universities [PA2020GDKC0014, JZ2020HGTB0051, JZ2018HGXC0001]
  3. Anhui Provincial Natural Science Foundation [2008085MF205]

向作者/读者索取更多资源

A facile method for the growth of high-quality beta-Ga2O3 thin films and assembly into a photodetector array has been reported. The array exhibits outstanding photoresponse performance and good spatial resolution under 265nm DUV illumination, showing potential for multifunctional DUV optoelectronic applications.
Solar-blind deep-ultraviolet (DUV) photodetectors based on Ga2O3 have attracted great attention due to their potential applications for many military and civil purposes. However, the development of device integration for optoelectronic system applications remains a huge challenge. Herein, we report a facile method for patterned-growth of high-quality beta-Ga2O3 thin films, which are assembled into a photodetectors array comprising 8 x 8 device units. A representative detector exhibits outstanding photoresponse performance, in terms of an ultra-low dark current of similar to 0.62 pA, a large I-light/I-dark ratio exceeding 10(4), a high responsivity of similar to 0.72 A W-1 and a decent specific detectivity of similar to 4.18 x 10(11) Jones, upon 265 nm DUV illumination. What is more, the DUV/visible (250/400 nm) rejection ratio is as high as 10(3) with a sharp response cut-off wavelength at similar to 280 nm. Further optoelectronic analysis reveals that the photodetectors array has good uniformity and repeatability, endowing it the capability to serve as a reliable DUV light image sensor with a decent spatial resolution. These results suggest that the proposed technique offers an effective avenue for patterned growth of beta-Ga2O3 thin films for multifunctional DUV optoelectronic applications. (C) 2021 Published by Elsevier Ltd on behalf of The editorial office of Journal of Materials Science & Technology.

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