期刊
JAPANESE JOURNAL OF APPLIED PHYSICS
卷 60, 期 5, 页码 -出版社
IOP PUBLISHING LTD
DOI: 10.35848/1347-4065/abf47a
关键词
gallium oxide; mist CVD; crystal growth; TEM; X-ray diffraction
资金
- JSPS KAKENHI [20H00246]
- Grants-in-Aid for Scientific Research [20H00246] Funding Source: KAKEN
The study compared the growth characteristics of α-Ga2O3 under different growth methods and revealed the unique mechanism of mist CVD-grown α-Ga2O3.
Recently, alpha-Ga2O3 has been attracting great attentions as a new wide bandgap semiconductor, however, the reason why metastable alpha-Ga2O3 is grown by mist chemical vapor deposition (CVD) has not been understood. In this study, in order to elucidate growth mechanism of mist CVD-grown alpha-Ga2O3, growth processes in the initial stage were investigated by atomic force microscopy, transmission electron microscopy, and X-ray diffraction reciprocal space mapping. We found that the characteristics of mist CVD make the relaxation mechanisms of alpha-Ga2O3 on (0001) sapphire different from those of molecular beam epitaxy, pulsed-laser deposition, and metalorganic chemical vapor deposition. We also proposed the growth procedure in the initial stage.
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