Design of Dual-Polarized Reflectarray for Near-Field Shaped Focusing

This letter presents a design of reflectarray for near-field (NF) shaped focusing, and a synthesis method is proposed to generate desired shaped pattern in the NF zone. The orthogonally arranged tridipoles structure is used to realize the dual-polarized reflectarray. The unit cell has continuous reflection phase-shift ranges (more than 360 degrees) under x-polarized and y-polarized incident E-fields. A sample reflectarray generating dual-polarized focused patterns is presented to validate the design. Experimental results show that the horizontal component of E-field has the shaped pattern of letter X, and the vertical component of E-field owns the shaped pattern of letter Y. Besides, the measured results are in good agreement with the theoretical analyses.

Automated summary

This letter introduces a design of a reflectarray for near-field shaped focusing, utilizing an orthogonally arranged tridipoles structure for dual-polarized reflectarray. The experimental results confirm the effectiveness of the design, showing good agreement with theoretical analyses.