Plasmonic semiconductor photocatalyst: Non-stoichiometric tungsten oxide

Semiconductor photocatalysis has attracted increasing attention due to its potential application in solving the problems related to energy crisis and environmental pollution. As a typical plasmonic semiconductor, nonstoichiometric tungsten oxide (WO3-X) has invoked significant interest for its unique property and excellent photocatalytic performance. In this review, we briefly introduce the fundamental properties of the WO3-x, and then summarize the synthesis methods such as solvothermal reaction, solid phase reduction and exfoliation treatment, together with the modification strategies such as doping and constructing homo-/hetero-junctions. Additionally, we emphasize the practical applications of WO3-x in hydrogen evolution, nitrogen fixation, carbon dioxide reduction, and pollutant degradation. Finally, comprehensive conclusions and perspectives on the fabrication of WO3-x photocatalyst leading to satisfactory performance are given as well.

Automated summary

Nonstoichiometric tungsten oxide (WO3-X) as a typical plasmonic semiconductor has unique properties and excellent photocatalytic performance, showing great potential in practical applications such as hydrogen evolution, nitrogen fixation, carbon dioxide reduction, and pollutant degradation. Through various synthesis methods and modification strategies, satisfactory performance of WO3-X photocatalyst can be achieved.