4.4 Article

In situ investigation of conducting interface formation in LaAlO3/SrTiO3 heterostructure

期刊

CURRENT APPLIED PHYSICS
卷 30, 期 -, 页码 53-57

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ELSEVIER
DOI: 10.1016/j.cap.2021.04.027

关键词

LaAlO3; SrTiO3; Conducting interface; Oxygen vacancy; Angle-resolved photoemission spectroscopy

资金

  1. Basic Study and Interdisciplinary R&D Foundation Fund of the University of Seoul (2019)
  2. National Research Foundation (NRF) - Korean government [NRF2019K1A3A7A09033389]
  3. Office of Science, Office of Basic Energy Sciences, of the U.S. Department of Energy [DE-AC02-05CH11231]
  4. Swiss National Science Foundation (SNSF) [PBELP2-125484]
  5. [IBS-R009-D1]
  6. Swiss National Science Foundation (SNF) [PBELP2-125484] Funding Source: Swiss National Science Foundation (SNF)

向作者/读者索取更多资源

This research used in situ angle-resolved photoemission spectroscopy to elucidate the mechanisms for the formation of the high-mobility conducting interface (CI) between LaAlO3 (LAO) and SrTiO3 (STO); The study shows that the built-in potential (V-bi) and oxygen gas (O-2(g)) exposure have an effect on CI formation, and UV irradiation can alter V-bi.
The high-mobility conducting interface (CI) between LaAlO3 (LAO) and SrTiO3 (STO) has revealed many fascinating phenomena, including exotic magnetism and superconductivity. But, the formation mechanism of the CI has not been conclusively explained. Here, using in situ angle-resolved photoemission spectroscopy, we elucidated the mechanisms for the CI formation. In as-grown samples, we observed a built-in potential (V-bi) proportional to the polar LAO thickness starting from the first unit cell (UC) with CI formation appearing above 3 UCs. However, we found that the V-bi is removed by synchrotron ultraviolet (UV)-irradiation; The built-in potential is recovered by oxygen gas (O-2(g))-exposure. Furthermore, after UV-irradiation, the CI appears even below 3UC of LAO. Our results demonstrate not only the V-bi-driven CI formation in as-grown LAO/STO, but also a new route to control of the interface state by UV lithographic patterning or other surface modification.

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