4.6 Article

Benzenedisulfonic Acid as an ALD/MLD Building Block for Crystalline Metal-Organic Thin Films**

期刊

CHEMISTRY-A EUROPEAN JOURNAL
卷 27, 期 34, 页码 8799-8803

出版社

WILEY-V C H VERLAG GMBH
DOI: 10.1002/chem.202100538

关键词

atomic layer deposition; molecular layer deposition; metal-organic frameworks; solid electrolyte; sulfonate

资金

  1. Academy of Finland
  2. European Union [721065]

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Two new atomic/molecular layer deposition processes were developed for depositing crystalline metal-organic thin films using 1,4-benzenedisulfonate as the organic linker and either Cu or Li as the metal node. The resulting films can be transformed from hydrated phases to unhydrated phases, with the unhydrated Li-BDS films showing potential for applications as thin film solid polymer Li-ion conductors.
Two new atomic/molecular layer deposition processes for depositing crystalline metal-organic thin films, built from 1,4-benzenedisulfonate (BDS) as the organic linker and Cu or Li as the metal node, are reported. The processes yield in-situ crystalline but hydrated Cu-BDS and Li-BDS films; in the former case, the crystal structure is of a previously known metal-organic-framework-like structure, while in the latter case not known from previous studies. Both hydrated materials can be readily dried to obtain the crystalline unhydrated phases. The stability and the ionic conductivity of the unhydrated Li-BDS films were characterized to assess their applicability as a thin film solid polymer Li-ion conductor.

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