4.7 Article

Improved switching and synapse characteristics using PEALD SiO2 thin film in Cu/SiO2/ZrO2/Pt device

期刊

APPLIED SURFACE SCIENCE
卷 547, 期 -, 页码 -

出版社

ELSEVIER
DOI: 10.1016/j.apsusc.2021.149140

关键词

Plasma enhanced atomic layer deposition; Silicon dioxide; Diffusion limiting layer; Artificial synapse; Neuromorphic engineering

资金

  1. National Research Foundation of Korea (NRF) - Ministry of science, ICT & Future Planning [NRF-2019R1F1A1057243, NRF-2020M3F3A2A02082449]
  2. MOTIE (Ministry of Trade, Industry Energy) [10080689, 20003808, 20004399]
  3. KSRC (Korean Semiconductor Research Consortium)
  4. Korea Evaluation Institute of Industrial Technology (KEIT) [20004399, 20003808, 10080689] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

向作者/读者索取更多资源

The study investigates the role of inserting a diffusion limiting layer in a synapse device operated by the migration of metal cations to improve linear conductance change characteristics. By inserting a thin SiO2 layer at the Cu/ZrO2 interface, the random diffusion of Cu ions is effectively mitigated, leading to improved multi-level RESET switching characteristics and enhanced linearity of conductance with the number of pulses. Various synaptic characteristics such as potentiation, depression, short-term to long-term memory transition, pulse-paired facilitation, post-tetanic potentiation, and spike timing dependent plasticity were successfully emulated.
As the demand for data increases rapidly, neuromorphic computing, which can process parallel data and consume low power, is attracting to mimic the human nervous system. Resistive switching memory is considered as a viable element to realize neuromorphic computing due to high power and area efficiency. Although many previous studies have emphasized the linearity of analog switching, which is essential for realizing an ideal artificial synapse, it is still limited to control the diffusion of oxygen vacancies and suppress abrupt switching. Switching mechanism depends on the growth and dissolution of oxygen-deficient filaments, which could cause random variation. In this study, to further improve linear conductance change characteristics, we investigate the role of inserting a diffusion limiting layer in the synapse device operated by the migration of metal cations. Inserting thin SiO2 was prepared by plasma enhanced atomic layer deposition at the Cu/ZrO2 interface. This effectively mitigates the random diffusion of Cu ions and can perform multi-level RESET switching characteristics, which significantly improve the linearity of conductance with the number of pulses. In addition, various synaptic characteristics of potentiation and depression, short-term memory to long-term memory transition, pulse-paired facilitation, and post-tetanic potentiation, spike timing dependent plasticity were successfully emulated.

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