4.7 Article

Synchrotron X-ray topographic image contrast variation of screw-type basal plane dislocations located at different depths below the crystal surface in 4H-SiC

期刊

ACTA MATERIALIA
卷 208, 期 -, 页码 -

出版社

PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.actamat.2021.116746

关键词

Synchrotron X-ray topography; Dislocations; Silicon carbide; Simulation

资金

  1. JSPS [JP20J13314]

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The contrast features of synchrotron X-ray topographic images of screw-type basal plane dislocations in on-axis 4H-SiC wafers have been studied, and the correlation between the contrast features and the depth of the screw BPDs below the crystal surface has been demonstrated for estimating the depth.
The contrast features of synchrotron X-ray topographic images of screw-type basal plane dislocations (BPDs) in on-axis 4H-SiC wafers have been studied. Screw BPD images are categorized into two types: one exhibiting a white line bordered by black lines and the other a pure black line contrast. Similar images for off-axis specimens and the corresponding ray-tracing simulations demonstrate that these contrasts can be attributed to the depth of the screw BPDs below the crystal surface. The correlation of the contrast features between simulations and the screw BPD topography images can be used to estimate the depth. (C) 2021 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.

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