Large Area Patterning of Nanoparticles and Nanostructures: Current Status and Future Prospects

Nanoparticles possess exceptional optical, magnetic, electrical, and chemical properties. Several applications, ranging from surfaces for optical displays and electronic devices, to energy conversion, require large-area patterns of nanoparticles. Often, it is crucial to maintain a defined arrangement and spacing between nanoparticles to obtain a consistent and uniform surface response. In the majority of the established patterning methods, the pattern is written and formed, which is slow and not scalable. Some parallel techniques, forming all points of the pattern simultaneously, have therefore emerged. These methods can be used to quickly assemble nanoparticles and nanostructures on large-area substrates into well-ordered patterns. Here, we review these parallel methods, the materials that have been processed by them, and the types of particles that can be used with each method. We also emphasize the maximal substrate areas that each method can pattern and the distances between particles. Finally, we point out the advantages and disadvantages of each method, as well as the challenges that still need to be addressed to enable facile, on-demand large-area nanopatterning.

Automated summary

This article reviews parallel methods for large-area nanopatterning, highlighting the materials and applications involved in each method, emphasizing the maximum pattern area and particle spacing. It also discusses the advantages, disadvantages, and challenges that still need to be addressed in order to achieve efficient and on-demand nanopatterning on a large scale.