4.8 Article

Nanoscale Heterogeneities and Composition-Reactivity Relationships in Copper Vanadate Photoanodes

期刊

ACS APPLIED MATERIALS & INTERFACES
卷 13, 期 20, 页码 23575-23583

出版社

AMER CHEMICAL SOC
DOI: 10.1021/acsami.1c01848

关键词

scanning X-ray microscopy; water splitting; chemical heterogeneity; photoelectrochemistry; copper vanadate; thin film

资金

  1. Laboratory Directed Research and Development Program of Lawrence Berkeley National Laboratory under U.S. Department of Energy [DE-AC02-05CH11231]
  2. Advanced Light Source, a U.S. DOE Office of Science User Facility [DE-AC02-05CH11231]
  3. Office of Science of the U.S. Department of Energy [DESC0004993]
  4. Deutsche Forschungsgemeinschaft (DFG, German Research Foundation) [428591260]
  5. Deutsche Forschungsgemeinschaft (DFG, German Research Foundation) under Germany's Excellence Strategy [EXC 2089/1-390776260]

向作者/读者索取更多资源

The photoelectrochemical performance of thin film photoelectrodes can be influenced by deviations in stoichiometry, particularly at the nanoscale. Films with different chemical compositions show varying electronic tolerance and photoresponse. Microscopic variations in chemical composition correlate with macroscopic photoelectrochemical performance.
The photoelectrochemical performance of thin film photoelectrodes can be impacted by deviations from the stoichiometric composition, both at the macroscale and at the nanoscale. This issue is especially pronounced for the class of ternary compounds that are currently investigated for simultaneously achieving the optoelectronic characteristics and chemical stability required for solar fuel generation. Here, we combine macroscopic photoelectrochemical testing with atomic force microscopy (AFM) and scanning transmission X-ray microscopy (STXM) to reveal relationships between photoelectrochemical activity, nanoscale morphology, and local chemical composition in copper vanadate (CVO) thin films as a model system. For films with varying Cu/(Cu + V) ratios around the ideal stoichiometry of stoiberite Cu5V2O10, AFM resolves submicrometer morphology variations, which correlate with variations of the Cu content resolved by STXM. Both stoichiometric and Cu-deficient films exhibit a clear photoresponse, which indicates electronic tolerance to reduced Cu content. While both films exhibit homogeneous O and V content, they are also characterized by local regions of Cu enrichment and depletion that extend beyond individual grains. By contrast, Cu-rich photoelectrodes exhibit a tendency toward CuO secondary phase formation and a significantly reduced photoelectrochemical activity, indicating a significantly poor electronic tolerance to Cu-enrichment. These findings highlight that the average film composition at the macroscale is insufficient for defining structure-function relationships in complex ternary compounds. Rather, correlating microscopic variations in chemical composition to macroscopic photoelectrochemical performance provides insights into photocatalytic activity and stability that are otherwise not apparent from pure macroscopic characterization.

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