相关参考文献
注意:仅列出部分参考文献,下载原文获取全部文献信息。Hydrolysis and Condensation of n-BuSnCl3: Enabling Deposition of Smooth Metal Oxide Photoresist Thin Films
Nizan Kenane et al.
INORGANIC CHEMISTRY (2020)
Effect of Ambient Conditions on Radiation-Induced Chemistries of a Nanocluster Organotin Photoresist for Next-Generation EUV Nanolithography
J. Trey Diulus et al.
ACS APPLIED NANO MATERIALS (2020)
Organotin Carboxylate Reagents for Nanopatterning: Chemical Transformations during Direct-Write Electron Beam Processes
Meredith C. Sharps et al.
CHEMISTRY OF MATERIALS (2019)
On the Mechanism of Carbon Dioxide Reduction on Sn-Based Electrodes: Insights into the Role of Oxide Surfaces
Giane B. Damas et al.
CATALYSTS (2019)
Effect of Oxygen on Thermal and Radiation-Induced Chemistries in a Model Organotin Photoresist
Ryan T. Frederick et al.
ACS APPLIED MATERIALS & INTERFACES (2019)
Ambient-Pressure X-ray Photoelectron Spectroscopy Characterization of Radiation-Induced Chemistries of Organotin Clusters
J. Trey Diulus et al.
ACS APPLIED MATERIALS & INTERFACES (2019)
Thermal and radiation chemistry of butyltin oxo hydroxo: A model inorganic photoresist
Ryan T. Frederick et al.
MICROELECTRONIC ENGINEERING (2019)
Mechanistic Study of HafSOx Extreme Ultraviolet Inorganic Resists
Ryan T. Frederick et al.
JOURNAL OF PHYSICAL CHEMISTRY C (2018)
Photo-induced Fragmentation of a Tin-oxo Cage Compound
Jarich Haitjema et al.
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY (2018)
Dual-tone Application of a Tin-Oxo Cage Photoresist Under E-beam and EUV Exposure
Yu Zhang et al.
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY (2018)
Evaluation of Thermal and Radiation Induced Chemistries of Metal Oxo-Hydroxo Clusters for Next-Generation Nanoscale Inorganic Resists
Richard P. Oleksak et al.
ACS APPLIED NANO MATERIALS (2018)
Extreme ultraviolet patterning of tin-oxo cages
Jarich Haitjema et al.
JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS (2017)
Photochemical conversion of tin-oxo cage compounds studied using hard x-ray photoelectron spectroscopy
Yu Zhang et al.
JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS (2017)
Numeric Model for the Imaging Mechanism of Metal Oxide EUV Resists
W. D. Hinsberg et al.
ADVANCES IN PATTERNING MATERIALS AND PROCESSES XXXIV (2017)
Implications of Crystal Structure on Organotin Carboxylate Photoresists
Meredith C. Sharps et al.
CRYSTAL RESEARCH AND TECHNOLOGY (2017)
Alkyltin Keggin Clusters Templated by Sodium
Sumit Saha et al.
ANGEWANDTE CHEMIE-INTERNATIONAL EDITION (2017)
Extreme ultraviolet resist materials for sub-7 nm patterning
Li Li et al.
CHEMICAL SOCIETY REVIEWS (2017)
CO2-sensing properties and mechanism of nano-SnO2 thick-film sensor
Dandan Wang et al.
SENSORS AND ACTUATORS B-CHEMICAL (2016)
Characterization of HafSOx Inorganic Photoresists using Electron Stimulated Desorption
Ryan T. Frederick et al.
ADVANCES IN PATTERNING MATERIALS AND PROCESSES XXXIII (2016)
Fabrication of high-aspect ratio silicon nanopillars for tribological experiments
Pavlo V. Antonov et al.
JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS (2015)
Integrated Fab Process for Metal Oxide EUV Photoresist
Andrew Grenville et al.
ADVANCES IN PATTERNING MATERIALS AND PROCESSES XXXII (2015)
Low-LER Tin Carboxylate Photoresists using EUV
Ryan Del Re et al.
EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY VI (2015)
Chemical and Structural Investigation of High-Resolution Patterning with HafSOx
Richard P. Oleksak et al.
ACS APPLIED MATERIALS & INTERFACES (2014)
Sites for Methane Activation on Lithium-Doped Magnesium Oxide Surfaces
Karolina Kwapien et al.
ANGEWANDTE CHEMIE-INTERNATIONAL EDITION (2014)
Improving the adhesion of hydrogen silsesquioxane (HSQ) onto various substrates for electron-beam lithography by surface chemical modification
Zhiqiang Zhang et al.
MICROELECTRONIC ENGINEERING (2014)
Photolithographic properties of tin-oxo clusters using extreme ultraviolet light (13.5 nm)
Brian Cardineau et al.
MICROELECTRONIC ENGINEERING (2014)
EUV Resists based on Tin-Oxo Clusters
Brian Cardineau et al.
ADVANCES IN PATTERNING MATERIALS AND PROCESSES XXXI (2014)
High resolution HSQ nanopillar arrays with low energy electron beam lithography
Y. Guerfi et al.
MICROELECTRONIC ENGINEERING (2013)
Materials challenges for sub-20-nm lithography
James W. Thackeray
JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS (2011)
Di-n-butyltin oxide as a chemical carbon dioxide capturer
Laurent Plasseraud et al.
JOURNAL OF ORGANOMETALLIC CHEMISTRY (2010)
Electron-beam exposure mechanisms in hydrogen silsesquioxane investigated by vibrational spectroscopy and in situ electron-beam-induced desorption
D. L. Olynick et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B (2010)
Observing hydrogen silsesquioxane cross-linking with broadband CARS
Allison G. Caster et al.
JOURNAL OF RAMAN SPECTROSCOPY (2009)
High resolution, high sensitivity inorganic resists
Jason Stowers et al.
MICROELECTRONIC ENGINEERING (2009)
Activation of methane by oligomeric (Al2O3)(x)(+) (x=3,4,5): The role of oxygen-centered radicals in thermal hydrogen-atom abstraction
Sandra Feyel et al.
ANGEWANDTE CHEMIE-INTERNATIONAL EDITION (2008)
20 nm Line/space patterns in HSQ fabricated by EUV interference lithography
Yasin Ekinci et al.
MICROELECTRONIC ENGINEERING (2007)
Direct synthesis of dimethyl carbonate with supercritical carbon dioxide: Characterization of a key organotin oxide intermediate
Danielle Ballivet-Tkatchenko et al.
CATALYSIS TODAY (2006)
Reactivity of ditert-butyldimethoxystannane with carbon dioxide and methanol:: X-ray structure of the resulting complex
D Ballivet-Tkatchenko et al.
JOURNAL OF ORGANOMETALLIC CHEMISTRY (2006)
Insertion reaction of carbon dioxide into Sn-OR bond. Synthesis, structure and DFT calculations of di- and tetranuclear isopropylcarbonato tin(IV) complexes
Danielle Ballivet-Tkatchenko et al.
DALTON TRANSACTIONS (2006)
Thermal activation of methane by tetranuclear [V4O10](+)
Sandra Feyel et al.
ANGEWANDTE CHEMIE-INTERNATIONAL EDITION (2006)
Hydrogen silsesquioxane as a high resolution negative-tone resist for extreme ultraviolet lithography
I Junarsa et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B (2005)
Chemical amplification resists: Inception, implementation in device manufacture, and new developments
H Ito
JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY (2003)
Dynamic behavior of carbonate species on metal oxide surface: Oxygen scrambling between adsorbed carbon dioxide and oxide surface
H Tsuji et al.
LANGMUIR (2003)
Reactivity of carbon dioxide with n-butyl(phenoxy)-, (alkoxy)-, and (oxo)stannanes:: Insight into dimethyl carbonate synthesis
D Ballivet-Tkatchenko et al.
ORGANOMETALLICS (2000)