Effect of Particle Concentration on Surfactant-Induced Alteration of the Contact Line Deposition in Evaporating Sessile Droplets

Controlling and suppressing the so-called coffee-ring effect (CRE) is an issue of cardinal importance and intense interest in many industries and scientific fields. Here, the combined effect of the particle and surfactant concentration on the CRE is investigated by gradually adding Triton X-100 surfactant to colloidal suspensions of SiO2 nanoparticles in ethanol for various particle concentrations. First, the effect of particle concentration on the contact line dynamics during the evaporation of a sessile droplet is investigated. It is shown that increasing the particle concentration leads to an increase in pinning time and ring width, whereas the droplet's initial and dynamic contact angle remains unchanged. Afterward, the effect of different concentrations of surfactant is studied for different particle concentrations. It is concluded that the surfactant concentration at which the CRE is suppressed is dependent on the initial particle concentration of the colloid, and it increases as the particle concentration increases. Furthermore, as adding surfactant with a concentration lower than this critical concentration results in an unsuppressed CRE, it is shown that surpassing this concentration will result in a depletion of particles in the contact line. Moreover, it is demonstrated that this critical surfactant concentration has no significant effect on the droplet's geometry and the total evaporation time.

Automated summary

Controlling and suppressing the coffee-ring effect is important across industries and scientific fields. The study found that increasing particle concentration increases pinning time and ring width, while the droplet's initial and dynamic contact angle remain unchanged. Moreover, the critical surfactant concentration for suppressing CRE depends on the initial particle concentration and does not significantly affect droplet geometry or evaporation time.