Anisotropic e-near-zero multilayer structures for omnidirectional bending to the normal

Anisotropic e-near-zero effective medium multilayer structures for omnidirectional bending light to the normal are theoretically studied. A finite element method is presented, using a unit cell with Floquet port master and slave boundaries, for examining metal-dielectric multilayer structures to form the permittivity tensor. Ellipsometry measurements of CdO films are reported, and it is found that film thicknesses of similar to 50 nm are adequate for the metallic layer. Omnidirectional bending to the normal is verified for multilayer structures, and this method is shown to simplify the computations over using a typical full space approach.

Automated summary

Anisotropic e-near-zero effective medium multilayer structures for omnidirectional bending light to the normal were theoretically studied using a finite element method and ellipsometry measurements of CdO films. It was found that film thicknesses of around 50 nm are sufficient for the metallic layer. The method simplifies computations compared to a typical full space approach and verifies omnidirectional bending to the normal for multilayer structures.