Optimization of physical properties of sputtered silver films by change of deposition power for low emissivity applications

A silver (Ag) based low emissivity (low-e) coating with a three-layer stack configuration of aluminum doped zinc oxide (AZO)/Ag/AZO was prepared on a glass substrate using radio frequency (RF) magnetron sputtering. The deposition power is a crucial parameter on phase, microstructure, resistivity, optical properties and infrared emissivity of the Ag films. The sputtered Ag films at higher plasma power possessed a higher packing density, a better crystallinity, a lower resistivity as well as a lower infrared emissivity. Average reflection of the designed low-e coating with a structure of AZO/Ag/ AZO was about 98% in far infrared region which is higher than that of the low-e coatings with a same structure. This coating had an average transmission of 78.7% in the visible region and also a high figure-of-merit (FoM) value of 93.1 m Omega(-1). The results suggest that the deposited AZO/Ag/AZO is possessing a very promising application potentials to be used as low-e coatings and transparent conductive electrodes on glasses. (c) 2020 Elsevier B.V. All rights reserved.

Automated summary

A silver-based low-emissivity coating with a three-layer stack configuration of AZO/Ag/AZO was prepared on a glass substrate using RF magnetron sputtering, showing promising application potentials as low-e coatings and transparent conductive electrodes on glasses. The coating had high reflectivity in the far infrared region, high transmittance in the visible region, and a high figure-of-merit value.