Electro-sonical deposition of nanostructured Sb2Se3 films for optoelectronic applications

In this study, a film of antimony selenide (Sb2Se3) was deposited on the Fluorine-doped tin oxide (FTO) as a substrate via electrodeposition at the potential of -0.55 V and the temperature of 25 degrees C. The effect of ultrasound waves during electrodeposition was also investigated at different times. The structural, morphological, optical, optoelectronic, and temperature dependence of the electrical resistance of the samples was investigated. The results showed formation of the polycrystalline phase of orthorhombic Sb2Se3. It was observed that when the ultrasound waves were used, the crystallite size (grain) and energy band gap decreased. It was found that in samples with a specified configuration, the intensity of the photocurrent decreased with increasing deposition time. Additionally, the anodic and cathodic photocurrent behaviors of the samples depended on the type and location of the electrode connection. Furthermore, the electrical resistance of the samples decreased with increasing temperature. In the sample with the lowest deposition time, conductivity and electrical activation energy were reduced by applying ultrasound waves, but they were increased by increasing the deposition time. (C) 2020 Elsevier B.V. All rights reserved.

Automated summary

In this study, a film of antimony selenide (Sb2Se3) was electrodeposited on FTO substrate, and the effect of ultrasound waves was investigated, revealing a decrease in crystallite size and energy band gap. The intensity of photocurrent decreased with increasing deposition time in samples with a specified configuration.