期刊
IEEE TRANSACTIONS ON ELECTRON DEVICES
卷 68, 期 2, 页码 746-752出版社
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/TED.2020.3041434
关键词
FinFET; ISCAS'85; nano-electro mechanical switch (NEMS); nanowire FET (NWFET); power gating (PG)
资金
- Intel Mobile Communication
In this article, a double-clamped nano-electromechanical switch (NEMS) with low stand-by power is proposed as an effective solution to leakage issues in scaled CMOS-based power gating (PG) in logic circuits. The NEMS structure achieves low pull-in voltage, low hysteresis, low turn-on delay, and subthreshold slope, enabling reduction in stand-by power dissipation in sub 10-nm CMOS technologies. Experimental results demonstrate significant leakage energy reduction compared to sub 10-nm CMOS based PG in ISCAS'85 benchmark circuits.
In this article, we demonstrate a double-clamped nano-electromechanical switch (NEMS) with low stand-by power as an effective solution to the leakage issues in scaled CMOS-based power gating (PG) in logic circuits. The proposed NEMS structure is achieved to have a low pull-in (similar to 1.2 V), low hysteresis (<0.3 V), low turnon delay (35 ns), and subthreshold slope of <6 mV/decade. This enables reduction in stand-by power dissipation in sub 10-nm CMOS technologies with a narrow 100 nm dimple gap for the low-power NEMS. We illustrate that the PG in ISCAS'85 benchmark circuits using the proposed fabricated NEMS shows significant leakage energy reduction for T-ON/T-OFF < 0.01 as compared to the sub 10-nm CMOS based PG.
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