期刊
CHEMISTRY-A EUROPEAN JOURNAL
卷 27, 期 23, 页码 6985-6992出版社
WILEY-V C H VERLAG GMBH
DOI: 10.1002/chem.202005152
关键词
alpha; beta-unsaturated ketones; epoxidation; hydrogen peroxide; metal– organic frameworks; Zr
资金
- Ministry of Science and Higher Education of the Russian Federation [AAAA-A21-121011390008-4]
- Russian Foundation for Basic Research [18-29-04022]
Zr-abtc metal-organic framework shows superior catalytic performance in H2O2-based selective oxidations, particularly in the epoxidation of electron-deficient alkenes like enones, due to a nucleophilic oxidation mechanism and a larger amount of weak basic sites on the framework. The retention of Zr-abtc structure after catalysis was confirmed by XRD and FTIR studies. On the other hand, the low activity of MIP-200 in H2O2-based oxidations is likely attributed to its hydrophilicity, which hinders the adsorption of organic substrates and H2O2.
The catalytic performance of Zr-abtc and MIP-200 metal-organic frameworks consisting of 8-connected Zr-6 clusters and tetratopic linkers was investigated in H2O2-based selective oxidations and compared with that of 12-coordinated UiO-66 and UiO-67. Zr-abtc demonstrated advantages in both substrate conversion and product selectivity for epoxidation of electron-deficient C=C bonds in alpha,beta-unsaturated ketones. The significant predominance of 1,2-epoxide in carvone epoxidation, coupled with high sulfone selectivity in thioether oxidation, points to a nucleophilic oxidation mechanism over Zr-abtc. The superior catalytic performance in the epoxidation of unsaturated ketones correlates with a larger amount of weak basic sites in Zr-abtc. Electrophilic activation of H2O2 can also be realized, as evidenced by the high activity of Zr-abtc in epoxidation of the electron-rich C=C bond in caryophyllene. XRD and FTIR studies confirmed the retention of the Zr-abtc structure after the catalysis. The low activity of MIP-200 in H2O2-based oxidations is most likely related to its specific hydrophilicity, which disfavors adsorption of organic substrates and H2O2.
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