Surface characterization determined from the secondary electron emission coefficient upon ion bombardment

The ion induced electron emission yield upon Ar+ ion impact at 420 eV was measured for a stainless-steel sample that was partially covered with a 50 nm thick gold layer. The ion induced electron emission yield for the two target materials differs strongly and enables to reproduce the shape of the gold film with a spatial resolution that corresponds to the width of the ion beam, which is 240 mu m in the present case. Details in the two-dimensional map of the ion induced electron emission yield are explained by comparison with optical and scanning electron microscopy as well as with X-ray photoelectron spectroscopy measurements of the sample surface. In contrast to the sputtering efficiency, the ion induced electron emission yield does not depend on the orientation of the crystal structure.

Automated summary

The study investigated the impact of Ar+ ions at 420 eV on a stainless-steel sample partially coated with a 50 nm thick gold layer, revealing significant differences in the ion-induced electron emission yield between the two target materials, allowing for accurate reproduction of the shape of the gold film. Comparison with optical and scanning electron microscopy, as well as X-ray photoelectron spectroscopy measurements of the sample surface, explained details in the two-dimensional map of the ion-induced electron emission yield. Unlike sputtering efficiency, the ion-induced electron emission yield was found to be independent of the orientation of the crystal structure.