4.6 Article

Analysis of Direct Optical Ablation and Sequent Thermal Ablation for the Ultrashort Pulsed Laser Photo-Thermal Micromachining

期刊

COATINGS
卷 10, 期 12, 页码 -

出版社

MDPI
DOI: 10.3390/coatings10121151

关键词

ultra-short pulsed laser; optical ablation; photo-thermal processing

资金

  1. Dongguan Social Science and Technology Development (Major) Project [2020507156175]
  2. Natural Science Foundation of Guangdong province, China [2018A0303070004]
  3. Research Item of Natural Science of Guangdong University of Petrochemical Technology [2019rc66]
  4. Ministry of Science and Technology [MOST 108-2221-E-146-003-]
  5. Guangdong Educational Department of Scientific Research Project [2017GKTSCX105]
  6. Dongguan Polytechnic Scientific Research Fund [2017a04]
  7. Dongguan Polytechnic Quality Engineering Project [JGZD201826]

向作者/读者索取更多资源

An ultra-fast pulsed laser for materials processing can obtain submicrometer- to nanometer-sized parts or patterns (precision or accuracy) because the heat cannot diffuse in time for an ultra-fast pulsed duration, and this causes a threshold of ablation in multi-photoabsorption. The optical and thermal effects significantly affect the processing quality of an ultrashort pulsed laser for materials. This study utilizes a Laplace transform method to display the optical and thermal effects on the temperature field and the ablated depth of an ultrashort pulsed laser processing of materials. The results reveal that If an ultrafast pulsed laser-induced heat can keep the irradiated region above the evaporated temperature until the thermal diffusion occurs in the lattice of materials, thermal ablation occurs. The optical ablation can get a better processing quality due to less thermal diffusion. This study theoretically elucidates that the depth of optical ablation approximates the product of an optical absorption length and the logarithm of the ratio of laser fluence to laser fluence threshold. It has also been shown that the optical and thermal ablation, respectively, occur in low and high laser fluence because the optical ablation depends directly on the main source of the incident ultrashort pulsed laser. However, the thermal ablation is determined by the residual heat directly from the incident ultrashort pulsed laser after the optical ablation. The increase rate of the ablated depth per pulse with laser fluence is actually lower at high laser fluences than that at low laser fluences because the thermal ablation using the residual heat directly from the incident ultrashort pulsed laser is governed at high laser fluences. This study will provide the closed-form of a solution that elucidate the direct optical ablation and sequent thermal ablation for the ultra-fast pulsed laser photo-thermal processing.

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