期刊
NANOMATERIALS
卷 11, 期 1, 页码 -出版社
MDPI
DOI: 10.3390/nano11010041
关键词
black silicon; light absorption enhanced; micro-nano manufacturing; nanometer surface
类别
资金
- Natural Science Foundation of Shanxi Province, China [201801D221212, 201801D221197]
- Fund for Key Laboratory of Equipment Pre-research [6142001190409]
- Zhejiang Provincial Natural Science Foundation of China [LD21F050001]
- Development Project of Zhejiang Province [2021C03019]
Black silicon, discovered by coincidence, possesses unique material properties and has been applied in various fields such as photodetectors, photovoltaic cells, photo-electrocatalysis, antibacterial surfaces, and sensors. With the advancement of fabrication technology, black silicon continues to expand in different applications, making it a research hotspot.
Since black silicon was discovered by coincidence, the special material was explored for many amazing material characteristics in optical, surface topography, and so on. Because of the material property, black silicon is applied in many spheres of a photodetector, photovoltaic cell, photo-electrocatalysis, antibacterial surfaces, and sensors. With the development of fabrication technology, black silicon has expanded in more and more applications and has become a research hotspot. Herein, this review systematically summarizes the fabricating method of black silicon, including nanosecond or femtosecond laser irradiation, metal-assisted chemical etching (MACE), reactive ion etching (RIE), wet chemical etching, electrochemical method, and plasma immersion ion implantation (PIII) methods. In addition, this review focuses on the progress in multiple black silicon applications in the past 10 years. Finally, the prospect of black silicon fabricating and various applications are outlined.
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