期刊
NANOMATERIALS
卷 11, 期 1, 页码 -出版社
MDPI
DOI: 10.3390/nano11010147
关键词
silica; polystyrene; maghemite supraparticles; patchy particles; seeded-growth emulsion polymerization; solvent-induced self-assembly
类别
资金
- Lebanese University
- Azm & Saade association
Fabrication of future materials through self-assembly of nano-building blocks programmed to generate specific lattices is a challenging goal of nanotechnology. A simple strategy to fabricate nanoparticles with multiple silica patches has been developed, showing potential applications in controlling the properties of particles through experimental parameters. Further developments include obtaining pure batches and optimizing the relative position of patches for repulsion figures.
Fabricating future materials by self-assembly of nano-building blocks programmed to generate specific lattices is among the most challenging goals of nanotechnology and has led to the recent concept of patchy particles. We report here a simple strategy to fabricate polystyrene nanoparticles with several silica patches based on the solvent-induced self-assembly of silica/polystyrene monopods. The latter are obtained with morphological yields as high as 99% by seed-growth emulsion polymerization of styrene in the presence of 100 nm silica seeds previously modified with an optimal surface density of methacryloxymethyl groups. In addition, we fabricate magnetic silica seeds by silica encapsulation of preformed maghemite supraparticles. The polystyrene pod, i.e., surface nodule, serves as a sticky point when the monopods are incubated in a bad/good solvent mixture for polystyrene, e.g., ethanol/tetrahydrofuran mixtures. After self-assembly, mixtures of particles with two, three, four silica or magnetic silica patches are mainly obtained. The influence of experimental parameters such as the ethanol/tetrahydrofuran volume ratio, monopod concentration and incubation time is studied. Further developments would consist of obtaining pure batches by centrifugal sorting and optimizing the relative position of the patches in conventional repulsion figures.
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