期刊
MATERIALS
卷 14, 期 2, 页码 -出版社
MDPI
DOI: 10.3390/ma14020274
关键词
binary colloidal array; polystyrene nanosphere; spin coating; concurrent and sequential coating; process optimization
类别
资金
- Chang Gung Memorial Hospital [CMRPD2K0081]
- Ministry of Science and Technology, Taiwan [109-2221-E-182058-MY2]
This paper investigates the binary colloid assembly of nanospheres using spin coating techniques, comparing the effects of concurrent and sequential coating processes. It demonstrates that optimal processing conditions can lead to successful binary colloidal arrays using both coating methods.
This paper reports the binary colloid assembly of nanospheres using spin coating techniques. Polystyrene spheres with sizes of 900 and 100 nm were assembled on top of silicon substrates utilizing a spin coater. Two different spin coating processes, namely concurrent and sequential coatings, were employed. For the concurrent spin coating, 900 and 100 nm colloidal nanospheres of latex were first mixed and then simultaneously spin coated onto the silicon substrate. On the other hand, the sequential coating process first created a monolayer of a 900 nm nanosphere array on the silicon substrate, followed by the spin coating of another layer of a 100 nm colloidal array on top of the 900 nm array. The influence of the processing parameters, including the type of surfactant, spin speed, and spin time, on the self-assembly of the binary colloidal array were explored. The empirical outcomes show that by employing the optimal processing conditions, binary colloidal arrays can be achieved by both the concurrent and sequential spin coating processes.
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