4.8 Article

High-resolution combinatorial patterning of functional nanoparticles

期刊

NATURE COMMUNICATIONS
卷 11, 期 1, 页码 -

出版社

NATURE RESEARCH
DOI: 10.1038/s41467-020-19771-0

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资金

  1. National Key Technologies R&D Program of China [2016YFA0201104]
  2. National Basic Research Program of China [2015CB659400]
  3. National Natural Science Foundation of China [11574142, 11621091, 22075128]
  4. Fundamental Research Funds for the Central Universities [14380166]
  5. Jiangsu Innovative and Entrepreneurial Talent Award
  6. State Key Laboratory of Analytical Chemistry for Life Science (SKLACLS2017)

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Fast, low-cost, reliable, and multi-component nanopatterning techniques for functional colloidal nanoparticles have been dreamed about by scientists and engineers for decades. Although countless efforts have been made, it is still a daunting challenge to organize different nanocomponents into a predefined structure with nanometer precision over the millimeter and even larger scale. To meet the challenge, we report a nanoprinting technique that can print various functional colloidal nanoparticles into arbitrarily defined patterns with a 200nm (or smaller) pitch (>125,000 DPI), 30nm (or larger) pixel size/linewidth, 10nm position accuracy and 50nm overlay precision. The nanopatterning technique combines dielectrophoretic enrichment and deep surface-energy modulation and therefore features high efficiency and robustness. It can form nanostructures over the millimeter-scale by simply spinning, brushing or dip coating colloidal nanoink onto a substrate with minimum error (error ratio < 2x10(-6)). This technique provides a powerful yet simple construction tool for large-scale positioning and integration of multiple functional nanoparticles toward next-generation optoelectronic and biomedical devices. Precise patterning of functional nanoparticles can provide a powerful tool for next-generation macroscale devices. Here, the authors report a reliable nanoprinting technique that can pattern various functional nanoparticles on the substrate with a 200nm pitch and 10nm position accuracy, and above the millimeter scale.

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