期刊
PHYSICAL REVIEW LETTERS
卷 126, 期 1, 页码 -出版社
AMER PHYSICAL SOC
DOI: 10.1103/PhysRevLett.126.016101
关键词
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资金
- National Science Foundation (NSF) [DMR1709380]
- U.S. Department of Energy (DOE) Office of Science [DE-SC0017802]
- DOE Office of Science [DE-SC0012704]
- U.S. Department of Energy (DOE) [DE-SC0017802] Funding Source: U.S. Department of Energy (DOE)
In investigating the self-organized ion-beam nanopatterning of silicon using coherent x-ray scattering, a relationship similar to de Gennes narrowing is discovered. However, unlike the classic phenomenon, the dynamic surface exhibits a wide range of behaviors with compressed exponential relaxation at lengths corresponding to the dominant structural motif. This behavior is attributed to the morphological persistence of the self-organized surface ripple patterns.
Investigating the relationship between structure and dynamical processes is a central goal in condensed matter physics. Perhaps the most noted relationship between the two is the phenomenon of de Gennes narrowing, in which relaxation times in liquids are proportional to the scattering structure factor. Here, a similar relationship is discovered during the self-organized ion-beam nanopatterning of silicon using coherent x-ray scattering. However, in contrast to the exponential relaxation of fluctuations in classic de Gennes narrowing, the dynamic surface exhibits a wide range of behaviors as a function of the length scale, with a compressed exponential relaxation at lengths corresponding to the dominant structural motif-self-organized nanoscale ripples. These behaviors are reproduced in simulations of a nonlinear model describing the surface evolution. We suggest that the compressed exponential behavior observed here is due to the morphological persistence of the self-organized surface ripple patterns which form and evolve during ion-beam nanopatterning.
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