期刊
MATERIALS CHEMISTRY AND PHYSICS
卷 258, 期 -, 页码 -出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.matchemphys.2020.123838
关键词
Chromium-doped Ta3N5; Ammonia; Magnetron sputtering; SIMS Depth profiling
资金
- Western Sydney University
The effects of chromium doping on magnetron sputtered and thermally annealed Ta3N5 thin films were investigated for the first time. Structural and compositional evolution of these films were closely studied using XRD, SEM, and SIMS. Despite the favorable ionic radius, poor chromium solubility in Ta3N5 was indicated, requiring further work to characterize Cr-Ta3N5 with desirable properties.
The effects of chromium doping on magnetron sputtered and thermally annealed Ta3N5 thin films have been investigated for the first time. The structural and compositional evolution of these films were closely investigated using XRD, SEM and SIMS. A simple mechanism for the incorporation of chromium into the Ta3N5 lattice was described based on kinetic experiments and SIMS analysis. Some basic recommendations can be made regarding the optimal method of preparing Cr-Ta3N5, however there is still much work to be done in characterising Cr-Ta3N5 with appreciable properties. In particular, this investigation indicates poor Cr solubility in Ta3N5 in spite of the favourable ionic radius.
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