相关参考文献
注意:仅列出部分参考文献,下载原文获取全部文献信息。Area-Selective ALD of Ru on Nanometer-Scale Cu Lines through Dimerization of Amino-Functionalized Alkoxy Silane Passivation Films
Ivan Zyulkov et al.
ACS APPLIED MATERIALS & INTERFACES (2020)
Area-Selective Deposition: Fundamentals, Applications, and Future Outlook
Gregory N. Parsons et al.
CHEMISTRY OF MATERIALS (2020)
Area-Selective Atomic Layer Deposition of TiN Using Aromatic Inhibitor Molecules for Metal/Dielectric Selectivity
Marc J. M. Merkx et al.
CHEMISTRY OF MATERIALS (2020)
Nanoscale Encapsulation of Perovskite Nanocrystal Luminescent Films via Plasma-Enhanced SiO2 Atomic Layer Deposition
Yao Jing et al.
ACS APPLIED MATERIALS & INTERFACES (2020)
Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
Shashank Balasubramanyam et al.
ACS MATERIALS LETTERS (2020)
Area-Selective Atomic Layer Deposition Assisted by Self-Assembled Monolayers: A Comparison of Cu, Co, W, and Ru
Dara Bobb-Semple et al.
CHEMISTRY OF MATERIALS (2019)
Functional model for analysis of ALD nucleation and quantification of area-selective deposition
Gregory N. Parsons
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2019)
Status and prospects of plasma-assisted atomic layer deposition
Harm C. M. Knoops et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2019)
Atomic layer deposition of silicon-based dielectrics for semiconductor manufacturing: Current status and future outlook
Rafaiel A. Ovanesyan et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2019)
Vapor-deposited octadecanethiol masking layer on copper to enable area selective Hf3N4 atomic layer deposition on dielectrics studied by in situ spectroscopic ellipsometry
Laurent Lecordier et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2018)
Perspective: New process technologies required for future devices and scaling
R. Clark et al.
APL MATERIALS (2018)
Selective atomic layer deposition of MoSix on Si (001) in preference to silicon nitride and silicon oxide
Jong Youn Choi et al.
APPLIED SURFACE SCIENCE (2018)
Isotropic Atomic Layer Etching of ZnO Using Acetylacetone and O-2 Plasma
A. Mameli et al.
ACS APPLIED MATERIALS & INTERFACES (2018)
Area-Selective Atomic Layer Deposition Using Si Precursors as Inhibitors
Rizwan Khan et al.
CHEMISTRY OF MATERIALS (2018)
Self-Aligned Block and Fully Self-Aligned Via for iN5 Metal 2 Self-Aligned Quadruple Patterning
Benjamin Vincent et al.
EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY IX (2018)
Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
Alfredo Mameli et al.
ACS NANO (2017)
Reaction Mechanism of Area-Selective Atomic Layer Deposition for Al2O3 Nanopatterns
Seunggi Seo et al.
ACS APPLIED MATERIALS & INTERFACES (2017)
Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
Matthew D. Sampson et al.
ACS APPLIED MATERIALS & INTERFACES (2017)
EPE analysis of sub-N10 BEoL flow with and without fully self-aligned via using Coventor SEMulator3D
Joern-Holger Franke et al.
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXXI (2017)
Using Hydrogen To Expand the Inherent Substrate Selectivity Window During Tungsten Atomic Layer Deposition
Berc Kalanyan et al.
CHEMISTRY OF MATERIALS (2016)
Thermal atomic layer etching of crystalline aluminum nitride using sequential, self-limiting hydrogen fluoride and Sn(acac)2 reactions and enhancement by H2 and Ar plasmas
Nicholas R. Johnson et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2016)
Self-Correcting Process for High Quality Patterning by Atomic Layer Deposition
Fatemeh Sadat Minaye Hashemi et al.
ACS NANO (2015)
Dielectric Barrier, Etch Stop, and Metal Capping Materials for State of the Art and beyond Metal Interconnects
Sean W. King
ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY (2015)
Real-Time Observation of Atomic Layer Deposition Inhibition: Metal Oxide Growth on Self-Assembled Alkanethiols
Jason R. Avila et al.
ACS APPLIED MATERIALS & INTERFACES (2014)
In-situ spectroscopic ellipsometry study of copper selective-area atomic layer deposition on palladium
Xiaoqiang Jiang et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2014)
The use of atomic layer deposition in advanced nanopatterning
A. J. M. Mackus et al.
NANOSCALE (2014)
Modulation of the Growth Per Cycle in Atomic Layer Deposition Using Reversible Surface Functionalization
Angel Yanguas-Gil et al.
CHEMISTRY OF MATERIALS (2013)
Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
G. Dingemans et al.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY (2012)
Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
Vikrant R. Rai et al.
LANGMUIR (2012)
Atomic Layer Deposition: An Overview
Steven M. George
CHEMICAL REVIEWS (2010)
Area-Selective Atomic Layer Deposition of Lead Sulfide: Nanoscale Patterning and DFT Simulations
Wonyoung Lee et al.
LANGMUIR (2010)
Area-Selective ALD with Soft Lithographic Methods: Using Self-Assembled Monolayers to Direct Film Deposition
Xirong Jiang et al.
JOURNAL OF PHYSICAL CHEMISTRY C (2009)
In situ spectroscopic ellipsometry as a versatile tool for studying atomic layer deposition
E. Langereis et al.
JOURNAL OF PHYSICS D-APPLIED PHYSICS (2009)
Detection of a formate surface intermediate in the atomic layer deposition of high-k dielectrics using ozone
Jinhee Kwon et al.
CHEMISTRY OF MATERIALS (2008)
Al2O3 Atomic Layer Deposition with Trimethylaluminum and Ozone Studied by in Situ Transmission FTIR Spectroscopy and Quadrupole Mass Spectrometry
David N. Goldstein et al.
JOURNAL OF PHYSICAL CHEMISTRY C (2008)
Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
S. B. S. Heil et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2007)
Chemistry for positive pattern transfer using area-selective atomic layer deposition
R Chen et al.
ADVANCED MATERIALS (2006)
Thermal study of accumulation of conformational disorders in the self-assembled monolayers of C8 and C18 alkanethiols on the Au(111) surface
N Prathima et al.
LANGMUIR (2005)
Investigation of electrical conduction in carbon-doped silicon oxide using a voltage ramp method
KY Yiang et al.
APPLIED PHYSICS LETTERS (2003)