4.7 Article

Demonstration of the one-step continuous fabrication of flexible polymer ridge waveguides via nanochannel-guided lithography

期刊

出版社

ELSEVIER SCIENCE INC
DOI: 10.1016/j.jiec.2020.12.034

关键词

Ridge waveguide; Polymer waveguide; Nanochannel-guided lithography; One-step continuous patterning; Smooth sidewall surface

资金

  1. National Research Foundation of Korea (NRF) - Korean Government [2015R1A5A1037668, 2019R1F1A1062380, 2020R1F1A1073760, IITP-2020-2018-0-01798]
  2. National Research Foundation of Korea [2020R1F1A1073760, 2019R1F1A1062380] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

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The study demonstrates a facile one-step fabrication method of flexible ridge waveguides using NCL technology, achieving a smooth waveguiding core with low-loss waveguiding operation. The proposed technique may enable the continuous and seamless fabrication of scalable waveguides and photonic elements.
We demonstrate a facile one-step fabrication of flexible ridge waveguides by using the nanochannelguided lithography (NCL) that enables continuous extrusion of a polymer that forms waveguiding core ridge on an undercladding polymer substrate. NCL utilizes a well-cleaved mold edge with microtrench patterns to slide continuously over a UV-curable liquid resin-coated substrate under conformal contact, where the resin and substrate can be chosen for suitable waveguide core and undercladding materials. The local heating of a trench mold can control the viscosity of liquid resin for optimal filling into the microchannels followed by smooth extrusion, which is subsequently UV-cured. Such a smoothly extruded resin core exhibits a very smooth surface potentially promising for the low-loss waveguiding operation which was experimentally confirmed by optical insertion loss characterization. The proposed technique may provide a practical route to the continuous and seamless fabrication of scalable waveguides and photonic elements. (c) 2021 The Korean Society of Industrial and Engineering Chemistry. Published by Elsevier B.V. All rights reserved.

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