Preparation of Sn-NiO films and all-solid-state devices with enhanced electrochromic properties by magnetron sputtering method

In this paper, Sn-NiO films for a superior electrochromic performance were prepared by a simple one-step magnetron sputtering process. The amount of Sn in the Sn-NiO films was controlled by adjusting the sputtering power of the SnO2 target. The modification of the microstructure of the NiO film by Sn4+ ions refined the grain size, enlarged the electrochemically active surface and promoted the diffusion of lithium ions, thereby enhancing the electrochromic performances of a NiO film. Compared to pure NiO, the Sn-Ni0 film prepared at a 10 W sputtering power of SnO2 target obtained outstanding electrochromic performances, including large transmittance modulation (65.1%), high coloration efficiency (39.3 cm 2 C-1), fast switching speed (1.3 s and 1.4 s) and good cycling durability at a wavelength of 550 nm. Besides, an optimized Sn-NiO film was used as an anodic electrochromic layer to prepare inorganic all-solid-state electrochromic device (ECD) and the ECD displayed excellent electrochromic performance. The strategy of preparing NiO modified by Sn4+ ions presents an innovative direction to obtain high-performance electrochromic materials for energy-saving smart windows. (C) 2020 Elsevier Ltd. All rights reserved.

Automated summary

In this study, Sn-NiO films with superior electrochromic performance were prepared through a simple one-step magnetron sputtering process. By modifying the microstructure of the NiO film with Sn4+ ions, the grain size was refined, the electrochemically active surface was enlarged, and the diffusion of lithium ions was promoted, thus improving the electrochromic performances of the NiO film. The optimized Sn-NiO film showed outstanding electrochromic performances, including large transmittance modulation, high coloration efficiency, fast switching speed, and good cycling durability.