期刊
ELECTROCHIMICA ACTA
卷 366, 期 -, 页码 -出版社
PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.electacta.2020.137467
关键词
Water oxidation kinetics; BiVO4; Cobalt-based catalyst; Local structure; Atomic layer deposition
资金
- Scientific and Technical Research Council of Turkey (TUBITAK) [114Z305]
- Turkish Accelerator & Radiation Laboratory (TARLA)
In this study, cobalt-based catalysts were deposited on nanoporous BiVO4 with controlled thicknesses by atomic layer deposition (ALD). Different water oxidation activities in neutral pH conditions were observed, with the best performance achieved when a uniform ultrathin Co(OH)(2) layer was formed on BiVO4 surface.
The local structures of the water oxidation catalysts play an important role in reaction kinetics and the performance of the photoanodes. In this study, we deposited cobalt-based catalysts on nanoporous BiVO4 with controlled thicknesses by atomic layer deposition (ALD). Despite the similar oxidation states of cobalt in all depositions, different water oxidation activities in neutral pH conditions were observed. A dramatic photocurrent raise, lowered kinetic overpotential, and smaller charge transfer resistance across the photoanode/electrolyte interface were achieved when a uniform ultrathin Co(OH)(2) layer was formed on BiVO4. Photocurrent density for water oxidation showed a 95% enhancement at 0.6 V vs. RHE when the catalyst was in the form of Co(OH)(2), while an 80% increase was obtained for CoO. Ideal coordination of Co(OH)(2) on hydroxylated BiVO4 surface assists the charge transfer between the electrolyte and BiVO4 without increasing surface recombination. The results of this study emphasize the importance of controlling the local structure of the catalysts in the performance of the water splitting photoanodes. (c) 2020 Elsevier Ltd. All rights reserved.
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