期刊
COATINGS
卷 10, 期 11, 页码 -出版社
MDPI
DOI: 10.3390/coatings10111026
关键词
zinc tin oxide; transparent conductive oxide; work function; O-2 plasma; surface treatment; XPS; UPS
资金
- National Research Foundation of Korea (NRF) - Korea government (MSIT) [2018R1D1A1B07051429]
- National Research Foundation of Korea [2018R1D1A1B07051429] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
Work function tuning has a significant influence on the performance of semiconductor devices, owing to the formation of potential barriers at the interface between metal-semiconductor junctions. In this work, we introduce a technique for tuning the work function of ZnSnO thin films using high-density O-2 plasma treatment. The work function and chemical composition of the ZnSnO thin film surfaces were investigated with regards to plasma treatment time through UPS/XPS systems. The optical band gap was estimated using Tauc's relationship from transmittance data. The work function of Zn0.6Sn0.4O thin film increased from 4.16 eV to 4.64 eV, and the optical band gap increased from 3.17 to 3.23 eV. The surface of Zn0.6Sn0.4O thin films showed a smooth morphology with an average of 0.65 nm after O-2 plasma treatment. The O-2 plasma treatment technique exhibits significant potential for application in high-performance displays in optical devices, such as thin-film transistors (TFTs), light-emitting diodes (LEDs), and solar cells.
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