Metal Foam Electrode as a Cathode for Copper Electrowinning

The geometry of porous materials is complex, and the determination of the true surface area is important because it affects current density, how certain reactions will progress, their rates, etc. In this work, we have investigated the dependence of the electrochemical deposition of copper coatings on the geometry of the copper substrate (flat plates or 3D foams). Chronoamperometric measurements show that copper deposition occurs 3 times faster on copper foams than on a flat electrode with the same geometric area in the same potential range, making metal foams great electrodes for electrowinning. Using electrochemical impedance spectroscopy (EIS), the mechanism of copper deposition was determined at various concentrations and potentials, and the capacities of the double electric layer (DL) for both types of electrodes were calculated. The DL capacity on the foam electrodes is up to 14 times higher than that on the plates. From EIS data, it was determined that the charge transfer resistance on the Cu foam electrode is 1.5-1.7 times lower than that on the Cu plate electrode. Therefore, metal foam electrodes are great candidates to be used for processes that are controlled by activation polarization or by the adsorption of intermediate compounds (heterogeneous catalysis) and processes occurring on the entire surface of the electrode.