4.7 Article

Treatment of waste gas contaminated with dichloromethane using photocatalytic oxidation, biodegradation and their combinations

期刊

JOURNAL OF HAZARDOUS MATERIALS
卷 405, 期 -, 页码 -

出版社

ELSEVIER
DOI: 10.1016/j.jhazmat.2020.123735

关键词

Dichloromethane; Air pollution; Hydroxyl radicals; Photo-degradation; Stirred tank bioreactor; Process optimization

资金

  1. Xunta de Galicia [ED431C 2017/66]
  2. Qatar National Library

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The study found that factors such as gas flow rate, dichloromethane concentration, residence time, photocatalyst loading, and relative humidity significantly affect the efficiency of DCM removal through UV and UV-TiO2 processes, while biological treatment also showed promising removal performance. The AOPs-BT technology is confirmed to be effective in treating recalcitrant compounds present in waste gas.
The treatment of waste gas (WG) containing dichloromethane (DCM) using advanced oxidation processes (AOPs) [UV and UV-TiO2], biological treatment (BT), and their combination (AOPs-BT) was tested. AOP tests were performed in an annular photo-reactor (APHR), while BT was conducted in a continuous stirred tank bioreactor (CSTBR). The effects of gas flow rate (Q(gas)), inlet DCM concentration ([DCM](i)), residence time (tau), photocatalyst loading (PH-C-L) and % relative humidity (% RH) on the AOPs performance and the removal of DCM (%DCMr) were studied and optimized. The UV process exhibited %DCMr <= 12.5 % for tests conducted at a [DCM](i) <= 0.45 g/m(3), Q(gas) of 0.12 m(3)/h and tau of 27.6 s, respectively, and < 4 % when the [DCM](i) >= 4.2 g/m(3). The UV-TiO2 achieved a %DCMr >= 71 +/- 1.5 % at Q(gas) of 0.06 m(3)/h, [DCM](i) of 0.45 g/m(3), tau of 55.2 s, PH-C-L of 10 g/m(2), and %RH of 50, respectively. The BT process removed similar to 97.6 % of DCM with an elimination capacity (EC) of 234.0 g/m(3).h. Besides, the high %DCMr of similar to 98.5 % in the UV-BT and 99.7 % in the UV-TiO2-BT processes confirms AOPs-BT as a promising technology for the treatment of recalcitrant compounds present in WG.

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