4.6 Article

Lateral Profiling of Defects and Charges in Oxide Semiconductor Channel Thin-Film Transistors

期刊

IEEE TRANSACTIONS ON ELECTRON DEVICES
卷 67, 期 10, 页码 4234-4237

出版社

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/TED.2020.3012421

关键词

Logic gates; Thin film transistors; Time-varying systems; Time-domain analysis; Transient analysis; Capacitance; Capacitors; Defect; In-Ga-Zn-O (IGZO); lateral distribution; lateral profiling; metal-oxide-semiconductor (MOS); self-aligned; single pulse; thin-film transistor (TFT); top gate

资金

  1. Ministry of Trade, Industry Energy (MOTIE)
  2. Korea Semiconductor Research Consortium (KSRC) [10067739]
  3. National Research Foundation of Korea (NRF) - Ministry of Science and ICT (MSIT, Korea) [2015M3A7B7045470]
  4. Korea Institute for Advancement of Technology (KIAT) [P0008458, P0008750]
  5. Ministry of Health & Welfare (MOHW), Republic of Korea [P0008750] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
  6. National Research Foundation of Korea [2015M3A7B7045470] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

向作者/读者索取更多资源

The lateral distributions of free carriers and defects in a channel of top gate In-Ga-Zn-O thin-film transistors were extracted using a single pulse charge pumping method. A square pulse was applied to the gate, while the charge transport current was monitored at the source-drain. A transmission line model was used to confirm the charging mechanism and extract the effective charge length. The time dependence of the trapped charge density was determined by comparing the charging and discharging transient characteristics. The lateral profiles of the free carriers and defects were decoupled successfully using the time dependence of the effective charge length, free charges, and trapped charges.

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