Facile deposition of porous fluorine doped tin oxide by Dr. Blade method for capacitive applications

Three-dimensional macroporous fluorine-doped tin oxide (p-FTO) films were successfully deposited using commercial ink of FTO powder and SnCl2 salt via Dr. Blade method. Various features of p-FTO thin films were studied as a function of the ink composition and sintering temperature. The morphological studies corroborated formation of porous, uniform, and crack-free FTO films after annealing at 300 degrees C for 10 min in air. X-ray diffraction pattern demonstrated development of highly crystalline FTO films. The lowest sheet resistance of Omega/square was obtained for the p-FTO film with a thickness of 21 mu m. The capacitance of thin p-FTO films was investigated using a three-electrode system and the results illustrated that the p-FTO films had an ideal electric double-layer capacitive behavior over a wide range of scan rate potential. Electro-deposition of manganese oxide on porous FTO film surface enhanced the real capacitance from 5 to 36 mF/cm(2).

Automated summary

Three-dimensional macroporous fluorine-doped tin oxide (p-FTO) films were successfully deposited using commercial ink of FTO powder and SnCl2 salt via Dr. Blade method. The films showed porous, uniform, and crack-free structure after annealing, accompanied by high crystallinity. The capacitance and performance were enhanced by electro-deposition of manganese oxide on the film surface.