期刊
JOURNAL OF OPTICS
卷 22, 期 9, 页码 -出版社
IOP PUBLISHING LTD
DOI: 10.1088/2040-8986/aba03e
关键词
metasurfaces; amplitude modulation; epsilon-near-zero; indium-tin-oxide; doped semiconductors
类别
资金
- US Air Force Office of Scientific Research (AFOSR) [FA9550-18-1-0354]
- National Aeronautics and Space Administration (NASA) [80NSSC19K0213]
In this paper, we demonstrate an electrically tunable double epsilon-near-zero (D-ENZ) metasurface by incorporating an ultra-thin indium-tin-oxide layer (approximate to 5 nm) into an array of moderately-doped silicon (Si) nanobars. The D-ENZ phenomenon is achieved by accumulation and depletion of carrier densities in ITO and Si active layers under applying the external bias voltages. An active dual-band amplitude modulator is proposed which can realize the modulation depths of 0.86 and 0.71 at operating channels of lambda(1)= 1547 nm and lambda(2)= 1564.2 nm, leveraging the D-ENZ mechanism. The reasonably low intrinsic loss in such an optical device gives us the opportunity to have continuous amplitude modulation at both operating wavelengths without the necessity of a complicated multi-resonator unit-cell.
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