期刊
OPTICS COMMUNICATIONS
卷 464, 期 -, 页码 -出版社
ELSEVIER
DOI: 10.1016/j.optcom.2020.125544
关键词
Atomic layer deposition; Tapered glass monocapillary X-ray condenser; HfO2
类别
资金
- National Natural Science Foundation of China [11675019, 11875087]
- Chinese National Key Research and Development Plan [2018YFF0109100]
- Chinese Academy of Sciences Key Technology Research and Development Team [GJJSTD20170005]
The atomic layer deposition method was used for coating the high-density material on the inner surface of a tapered glass monocapillary X-ray condenser (TGMXC). In this paper, HfO2 was selected as the high-density material. A HfO2 film with about 50 nm thickness was coated on the inner surface of the TGMXC. The energy upper limit of focused X-ray increased by about two times. The HfO2 coated the TGMXC maintained a high reflectivity (better than 84%) for X-rays with an energy below 25 keV. The acceptance angle of 16.8 keV X-ray increased by about 1.8 mrad, theoretically.
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