Enhancement of properties of high-density material coated glass monocapillary X-ray condenser based on atomic layer deposition

The atomic layer deposition method was used for coating the high-density material on the inner surface of a tapered glass monocapillary X-ray condenser (TGMXC). In this paper, HfO2 was selected as the high-density material. A HfO2 film with about 50 nm thickness was coated on the inner surface of the TGMXC. The energy upper limit of focused X-ray increased by about two times. The HfO2 coated the TGMXC maintained a high reflectivity (better than 84%) for X-rays with an energy below 25 keV. The acceptance angle of 16.8 keV X-ray increased by about 1.8 mrad, theoretically.