Formation of Deposition Patterns Induced by the Evaporation of the Restricted Liquid

Evaporation-induced self-assembly of colloids or suspensions has received increasing attention. Given its critical applications in many fields of science and industry, we report deposition patterns constructed by the evaporation of the restricted aqueous suspension with polystyrene particles at different substrate temperatures and geometric container dimensions. With the temperature increases, the deposition patterns transition from honeycomb to multiring to island, which is attributed to the competition between the particle deposition rate U-p and the contact line velocity U-CL, and the dimension of the geometric container has an effect on the characteristics of patterns. In this paper, the formation of an ordered multiring pattern is mainly focused on as a result of U-p keeping up with U-CL such that the entire contact line can be pinned, that is, the periodic stick-slip motion of the contact line and the particle sedimentation. Moreover, based on the Onsager principle, we develop a theoretical model to reveal the physical mechanisms behind the multiring phenomena. The position and spacing of rings are measured, which shows that the theoretical prediction agrees well with experiments. We also find that the ring spacing decays exponentially from center to edge experimentally and theoretically. This may not only help us to understand the formation of the deposition patterns but also assist future design and control in practical applications. Evaporation-induced self-assembly of colloids or suspensions has received increasing attention. Given its critical applications in many fields of science and industry, we report deposition patterns constructed by the evaporation of the restricted aqueous suspension with polystyrene particles at different substrate temperatures and geometric container dimensions. With the temperature increases, the deposition patterns transition from honeycomb to multiring to island, which is attributed to the competition between the particle deposition rate U-P and the contact line velocity U-CL, and the dimension of the geometric container has an effect on the characteristics of patterns. In this paper, the formation of an ordered multiring pattern is mainly focused on as a result of U-P keeping up with U-CL such that the entire contact line can be pinned, that is, the periodic stick-slip motion of the contact line and the particle sedimentation. Moreover, based on the Onsager principle, we develop a theoretical model to reveal the physical mechanisms behind the multiring phenomena. The position and spacing of rings are measured, which shows that the theoretical prediction agrees well with experiments. We also find that the ring spacing decays exponentially from center to edge experimentally and theoretically. This may not only help us to understand the formation of the deposition patterns but also assist future design and control in practical applications.