相关参考文献
注意：仅列出部分参考文献，下载原文获取全部文献信息。Additive Manufacturing of Optical Quality Germania-Silica Glasses
Koroush Sasan et al.
ACS APPLIED MATERIALS & INTERFACES (2020)
Composition-Controlled Atomic Layer Deposition of Phase-Change Memories and Ovonic Threshold Switches with High Performance
Valerio Adinolfi et al.
ACS NANO (2019)
Atomic layer deposition of epitaxial ferroelectric barium titanate on Si(001) for electronic and photonic applications
Edward L. Lin et al.
JOURNAL OF APPLIED PHYSICS (2019)
Atomic layer deposition of functional multicomponent oxides
Mariona Coll et al.
APL MATERIALS (2019)
Synthesis of Doped, Ternary, and Quaternary Materials by Atomic Layer Deposition: A Review
Adriaan J. M. Mackus et al.
CHEMISTRY OF MATERIALS (2019)
Temperature dependence of the sticking coefficients of bis-diethyl aminosilane and trimethylaluminum in atomic layer deposition
Matthias C. Schwille et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2017)
Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
Guoyong Fang et al.
CHEMISTRY OF MATERIALS (2016)
Effect of GeO2 deposition temperature in atomic layer deposition on electrical properties of Ge gate stack
Masayuki Kanematsu et al.
JAPANESE JOURNAL OF APPLIED PHYSICS (2016)
Optical constants of germanium and thermally grown germanium dioxide from 0.5 to 6.6eV via a multisample ellipsometry investigation
Timothy Nathan Nunley et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B (2016)
Formation of chemically stable GeO2 on the Ge surface with pulsed metal-organic chemical vapor deposition
Shigehisa Shibayama et al.
APPLIED PHYSICS LETTERS (2015)
Electronic structure and optical properties of amorphous GeO2 in comparison to amorphous SiO2
Benjamin Walker et al.
JOURNAL OF NON-CRYSTALLINE SOLIDS (2015)
Designing high performance precursors for atomic layer deposition of silicon oxide
Anupama Mallikarjunan et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2015)
High-K materials and metal gates for CMOS applications
John Robertson et al.
MATERIALS SCIENCE & ENGINEERING R-REPORTS (2015)
Atomic layer deposition of perovskite oxides and their epitaxial integration with Si, Ge, and other semiconductors
Martin D. McDaniel et al.
APPLIED PHYSICS REVIEWS (2015)
Atomic Layer Deposition of Noble Metals and Their Oxides
Jani Hamalainen et al.
CHEMISTRY OF MATERIALS (2014)
Interface properties of Al2O3/Ge structures with thin Ge oxide interfacial layer formed by pulsed metal organic chemical vapor deposition
Teppei Yoshida et al.
JAPANESE JOURNAL OF APPLIED PHYSICS (2014)
A Facile Route for Producing Single-Crystalline Epitaxial Perovskite Oxide Thin Films
Andrew R. Akbashev et al.
NANO LETTERS (2014)
A brief review of atomic layer deposition: from fundamentals to applications
Richard W. Johnson et al.
MATERIALS TODAY (2014)
Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
Matti Putkonen et al.
THIN SOLID FILMS (2014)
Plasma-Assisted Atomic Layer Deposition of SrTiO3: Stoichiometry and Crystallinity Studied by Spectroscopic Ellipsometry
V. Longo et al.
ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY (2013)
Oxygen transport and GeO2 stability during thermal oxidation of Ge
S. R. M. da Silva et al.
APPLIED PHYSICS LETTERS (2012)
Adsorption and surface reaction of bis-diethylaminosilane as a Si precursor on an OH-terminated Si (001) surface
Seung-Bin Baek et al.
APPLIED SURFACE SCIENCE (2012)
LaAlO3/SrTiO3 Epitaxial Heterostructures by Atomic Layer Deposition
Nick M. Sbrockey et al.
JOURNAL OF ELECTRONIC MATERIALS (2012)
Atomic layer deposition of germanium-doped zinc oxide films with tuneable ultraviolet emission
Paul R. Chalker et al.
JOURNAL OF MATERIALS CHEMISTRY (2012)
Impact of Aminosilane Precursor Structure on Silicon Oxides by Atomic Layer Deposition
Mark L. O'Neill et al.
ELECTROCHEMICAL SOCIETY INTERFACE (2011)
First-principles Calculations of the Dielectric Constant for the GeO2 Films
Masahiro Tamura et al.
TECHNOLOGY EVOLUTION FOR SILICON NANO-ELECTRONICS (2011)
High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
Seok-Jun Won et al.
IEEE ELECTRON DEVICE LETTERS (2010)
A practical, self-catalytic, atomic layer deposition of silicon dioxide
Julien Bachmann et al.
ANGEWANDTE CHEMIE-INTERNATIONAL EDITION (2008)
Evidence of low interface trap density in GeO2/Ge metal-oxide-semiconductor structures fabricated by thermal oxidation
Hiroshi Matsubara et al.
APPLIED PHYSICS LETTERS (2008)
Dielectric Properties of Atomic Layer Deposited Thin-Film Barium Strontium Titanate
M. Tyunina et al.
INTEGRATED FERROELECTRICS (2008)
Gate dielectric formation and MIS interface characterization on Ge
S. Takagi et al.
MICROELECTRONIC ENGINEERING (2007)
Theoretical study of the insulating oxides and nitrides:: SiO2, GeO2, Al2O3, Si3N4, and Ge3N4
Cem Sevik et al.
JOURNAL OF MATERIALS SCIENCE (2007)
Dielectric behavior of Cu-GeO2 cermet thin films
Irine Banu Lucy
JOURNAL OF MATERIALS SCIENCE (2007)
Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process
RL Puurunen
JOURNAL OF APPLIED PHYSICS (2005)
Optical functions of (x)GeO2:(1-x)SiO2 films determined by multi-sample and multi-angle spectroscopic ellipsometry
CKF Ho et al.
OPTICS EXPRESS (2005)
Sintering and porosity control of (x)GeO2: (1-x)SiO2 sol-gel derived films for optoelectronic applications
CKF Ho et al.
ELECTROCHEMICAL AND SOLID STATE LETTERS (2004)
Low optical loss germanosilicate planar waveguides by low-pressure inductively coupled plasma-enhanced chemical vapor deposition
QY Zhang et al.
CHEMICAL PHYSICS LETTERS (2003)
分享论文
