期刊
ADVANCED ENGINEERING MATERIALS
卷 22, 期 10, 页码 -出版社
WILEY-V C H VERLAG GMBH
DOI: 10.1002/adem.202000258
关键词
metal assisted chemical etching; silicon; X-ray imaging; X-ray optics
资金
- SNF Sinergia Grant [CRSII5_18356]
- EU [ERC-2012-StG 31'0005]
- ERC-2016-PoC [727246]
- Eurostar Grant [E!1106]
- SNI NanoArgovia Grant [13.01]
- lottery fund SwissLOS of the Kanton of Aargau
- European Research Council (ERC) [727246] Funding Source: European Research Council (ERC)
Diffractive optics play a key role in hard X-rays imaging for which many scientific, technological, and biomedical applications exist. Herein, high-aspect-ratio microfabrication of gratings for X-ray interferometry is demonstrated using Pt as a catalyst for the metal assisted chemical etching of Si in a solution of HF and H2O2. The Pt layer is thermally treated to realize a porous catalyst layer that stabilizes the etching of a pattern with a pitch size from 4.8 to 20 mu m in the direction perpendicular to the Si substrate and an aspect ratio up to 60:1. The superior etching performance of Pt as a catalyst and its stability in a solution with high HF content are reported in direct comparison with the Au catalyst for the same grating parameters. The Si structure is then used as a template for filling with Au, as a high absorbing X-ray material. The Pt catalyst layer is used as a conductive seed for Au electroplating. The quality of the overall process is assessed by obtaining a visibility map using 30 mu m-thick Au grating in an X-ray interferometric setup at 20 keV.
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