Rapid and Large-Area Visualization of Grain Boundaries in MoS2 on SiO2 Using Vapor Hydrofluoric Acid

Grain boundaries in two-dimensional (2D) material layers have an impact on their electrical, optoelectronic, and mechanical properties. Therefore, the availability of simple large-area characterization approaches that can directly visualize grains and grain boundaries in 2D materials such as molybdenum disulfide (MoS2) is critical. Previous approaches for visualizing grains and grain boundaries in MoS2 are typically based on atomic resolution microscopy or optical imaging techniques (i.e., Raman spectroscopy or photoluminescence), which are complex or limited to the characterization of small, micrometer-sized areas. Here, we show a simple approach for an efficient large-area visualization of the grain boundaries in continuous chemical vapor-deposited films and domains of MoS2 that are grown on a silicon dioxide (SiO2) substrate. In our approach, the MoS2 layer on a SiO2/Si substrate is exposed to vapor hydrofluoric acid (VHF), resulting in the differential etching of SiO2 at the MoS2 grain boundaries and SiO2 underneath the MoS2 grains as a result of VHF diffusing through the defects in the MoS2 layer at the grain boundaries. The location of the grain boundaries can be seen by the resulting SiO2 pattern using optical microscopy, scanning electron microscopy, or Raman spectroscopy. This method allows for a simple and rapid evaluation of grain sizes in 2D material films over large areas, thereby potentially facilitating the optimization of synthesis processes and advancing applications of 2D materials in science and technology.