期刊
PHYSICAL REVIEW APPLIED
卷 13, 期 3, 页码 -出版社
AMER PHYSICAL SOC
DOI: 10.1103/PhysRevApplied.13.034074
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资金
- JSPS KAKENHI, Japan [JP18H03867]
- JST CREST, Japan [JPMJCR19J4]
We demonstrate a largely enhanced nonreciprocal propagation of spin waves (SWs) magnetoelastically excited in Ni/Si bilayer films. The nonreciprocity is attributed to the shear component of the strain tensor, which can be enlarged by increasing the thickness of the Si layer. By evaporating a 400-nm-thick Si layer on a Ni film, we enhanced the nonreciprocal ratio by up to 1200%. This finding paves the way for rectification of SWs in magnonic devices.
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