High Temperature Stable Anatase Phase Titanium Dioxide Films Synthesized by Mist Chemical Vapor Deposition

Pure anatase-phase titanium dioxide films stable up to high temperatures were successfully fabricated by the mist chemical vapor deposition method. A post-annealing treatment of the synthesized films was carried out in oxygen atmosphere in the temperature range from 600 to 1100 degrees C and no anatase to rutile transformation was observed up to 1000 degrees C. Based on the grazing incidence X-ray diffraction data, the average crystallite size of the titanium dioxide films increased gradually with increasing annealing temperature. The structural analysis revealed that the high thermal stability of the anatase phase can be attributed to the small crystallite size and a sheet-like grain structure. An incomplete anatase to rutile transformation was observed after annealing at 1100 degrees C.