4.7 Article

Novel Method for Electroless Etching of 6H-SiC

期刊

NANOMATERIALS
卷 10, 期 3, 页码 -

出版社

MDPI
DOI: 10.3390/nano10030538

关键词

chemical etching; silicon carbide; nanoparticles; X-ray photoemission spectroscopy; photoluminescence spectroscopy

资金

  1. Hungarian NKFIH of the EU QuantERA Nanospin project [127902]
  2. NKFIH [2017-1.2.1-NKP-2017-00001, NVKP_16-1-2016-0043]
  3. Bolyai Research Scholarship of HAS
  4. National Talent Program [NTP-NFTO-18-B-0243]
  5. National Excellence Program [UNKP-19-4-BME-83]
  6. OTKA SNN [118012]
  7. EMMI (BME FIKP-NAT)

向作者/读者索取更多资源

In this article, we report an electroless method to fabricate porous hexagonal silicon carbide and hexagonal silicon carbide nanoparticles (NPs) as small as 1 nm using wet chemical stain etching. We observe quantum confinement effect for ultrasmall hexagonal SiC NPs in contrast to the cubic SiC NPs. We attribute this difference to the various surface terminations of the two polytypes of SiC NPs.

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