4.6 Article

Vapor-Phase Deposition and Modification of Metal-Organic Frameworks: State-of-the-Art and Future Directions

期刊

CHEMISTRY-A EUROPEAN JOURNAL
卷 22, 期 41, 页码 14452-14460

出版社

WILEY-V C H VERLAG GMBH
DOI: 10.1002/chem.201601921

关键词

atomic layer deposition; chemical vapor deposition; metal-organic frameworks; solvent-free crystallization; vapor processing

资金

  1. Research FoundationFlanders (FWO)
  2. Research Foundation-Flanders (FWO)
  3. FWO
  4. KU Leuven [StG/14/07BF]

向作者/读者索取更多资源

Materials processing, and thin-film deposition in particular, is decisive in the implementation of functional materials in industry and real-world applications. Vapor processing of materials plays a central role in manufacturing, especially in electronics. Metal-organic frameworks (MOFs) are a class of nanoporous crystalline materials on the brink of breakthrough in many application areas. Vapor deposition of MOF thin films will facilitate their implementation in micro- and nanofabrication research and industries. In addition, vapor-solid modification can be used for postsynthetic tailoring of MOF properties. In this context, we review the recent progress in vapor processing of MOFs, summarize the underpinning chemistry and principles, and highlight promising directions for future research.

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